国際学会発表のみ掲載しています。

2023年度

• Yukito Ozawa, Kunio Okimura, Electrical and mechanical properties of flexible VO₂ films with insulator-metal transition grown on nanorod ZnO buffered polyimide sheet, International grand meeting, MRM2023/IUMRS-ICA2023, (2023, Dec. 11-15, Kyoto International Conference Center).
• Junpei Kidokoro, Lamisa Hoque, Mian Md.Suruz, Kunio Okimura, Toshihiro Nakanish, Self-sustained electrical oscillations based on negative resistance switching of VO₂ thin films grown on Al₂O₃ (001) with planer facing electrodes, International grand meeting, MRM2023/IUMRS-ICA2023, (2023, Dec. 11-15, Kyoto International Conference Center).
• Takuto Ohnuki, Kunio Okimura, Reki Nakamoto, Yuji Muraoka, Joe Sakai, and Masashi Kuwahara, Effect of crystallization of GST on phase transition temperature of VO₂ films in GST/VO₂ layered structures, International grand meeting, MRM2023/IUMRS-ICA2023, (2023, Dec. 11-15, Kyoto International Conference Center).
• Takuto Ohnuki, Kunio Okimura, Reki Nakamoto, Yuji Muraoka, Joe Sakai, and Masashi Kuwahara, Effect of crystallization of GST on IMT of VO₂ in GST/VO₂ layered structure (II) - Comparison between TiO₂ (001) and Al₂O₃ (001) substrates, Phase Change Oriented Science (PCOS)研究会2023, (2023, Nov. 16-17, Atami).

2022年度

• Y. Miyatake, Y. Ozawa, and K. Okimura, Flexible VO₂ films with insulator-metal transition grown on polyimide films. 43rd International Symposium on Dry Process, DPS 2022, (2022, Nov. 25, Osaka Prefectural Convention Center).
• Lamisa Hoque, Md. Suruz Mian, K. Okimura and T. Nakanishi, Study on Relation Between Voltage-induced Switching Behavior and Self-sustained Electrical Oscillations in Vanadium Dioxide Thin Films, 22nd International Vacuum Congress (IVC-22), Tue-PO1B-9, (2022, Sep. 12, Sapporo Convention Center).
• Y. Miyatake, Y. Ozawa, K.Okimura and T. Nakanishi, Fabrication and Characterization of Flexible VO₂ Films on Polyimide Sheets with Insulator-Metal Transition, 22nd International Vacuum Congress (IVC-22), Tue-PO1A-16 (2022, Sep. 12, Sapporo Convention Center).
• Md. Suruz Mian, M. Hagino, R. Kawahigashi, T. Nakano, and K. Okimura, Crystallinity Improvement of Zinc Oxide Films at Low Temperature Deposition Using Reactive HiPIMS, 22nd International Vacuum Congress (IVC-22), Tue-PO1A-18 (2022, Sep. 12, Sapporo Convention Center).

2021年度

• K. Okimura: Smart windows for energy savings and emerging technologies utilizing vanadium dioxide films with insulator-metal transition, 12th ISAJ (Indian Scientists Association in Japan) Symposium, 2021 (Hosted by Tokai University, Nov. 27, 2021).

2019年度

• T. Suwa, S. Imaizumi, T. Nakamura and K. Okimura : Effects of in-situ post annealing on the resistivity of Al-doped ZnO films prepared by rf magnetron sputtering, Proceedings of the 15th International Symposium on Sputtering and Plasma Processes (ISSP 2019) pp. 193-195. (14, June, Kanazawa Institute of Technology, 2019).

2018年度

• T. Suwa, T. Nakamura and K. Okimura : Effects of He gas addition on the growth of transparent conductive Al-doped ZnO films in radio frequency magnetron sputtering, Proceedings of 40th International Symposium on Dry Process, P-61, pp. 171-172. (Nagoya University, 2018).
• R. Tobe, K. Okimura and Md. Suruz Mian : Self-oscillation properties of M2-phase VO₂ film grown on conductive ITO by ICP-assisted sputtering, Proceedings of 40th International Symposium on Dry Process, P-76, pp. 201-202. (Nagoya University, 2018).
• Kunio Okimura and Tomohiro Aoto : Self-oscillation of Vanadium Dioxide Films grown on Conductive TiN Layers, Collaborative Conference on Materials Research (CCMR), (Songdo Convensia, Seoul, June 25-29, 2018). (Invited)
• Kunio Okimura : Smart Windows for Energy Saving using VO₂ Coatings on ZnO-Buffered Glasses, KMITL-TOKAI University Joint Seminar 2018, (Bangkok International Trade & Exhibition Centre). (Oct. 13, 2018).

2017年度

• Kazuki Yuzurihara and Kunio Okimura,“Electrical properties of RF magnetron sputtered Al-doped ZnO thin films and their dependence on radial substrate position”,39th International Symposium on Dry Process, P44, pp. 137-138. (Tokyo Institute of Technology) (Nov. 16,17, 2017).
• Ryuta Tobe, Tomohiro Aoto, Kenta Sato, Md. Suruz Mian, and Kunio Okimura,“Phase Transition Properties of VO2 Thin Films on Conductive TiN Layers", Micro/Nano Technology Center International Symposium (mntcis2017), Tokai University, Hiratsuka, Aug. 26, 27, 2017.
• Kenta Sato, Hiroaki Hoshino, Md. Suruz Mian, Kunio Okimura, and Yoshio Yasumori,“Electrical and optical properties of VO₂ films deposited on conductive Al:ZnO layer”, International Union of Materials Research Societies - The 15th International Conference on Advanced Materials (IUMRS-ICAM 2017), B1-P29-025, Kyoto, Japan, August, 2017.
• Tomohiro Aoto, Kenta Sato, Md. Suruz Mian, and Kunio Okimura,“Self-oscillation characteristics of oriented VO₂ films on conductive TiN/Ti layers”, International Union of Materials Research Societies - The 15th International Conference on Advanced Materials (IUMRS-ICAM 2017), B2-P30-021, Kyoto, Japan, August, 2017.
• H. Hoshino, K. Sato, M.S. Mian, Y. Yasumori, and K. Okimura,“Growth of VO₂ thin films on transparent conductive Al-doped ZnO films on glass substrates”, 14th International Symposium on Sputtering & Plasma Process(ISSP 2017), TF2-13p, Ishikawa, Japan, August, 2017.

　　 ※本発表はISSP 2017のBest Poster Awardを受賞した。

• T. Aoto, K. Sato, M.S. Mian, and K. Okimura,“Oriented growth of VO₂ thin films on conductive TiN/Ti layers and thiir self-oscillations phenomena”, 14th International Symposium on Sputtering & Plasma Process(ISSP 2017), TF2-15p, Ishikawa, Japan, August, 2017.
• K. Matsuoka, N.H. Azhan, and K. Okimura,“Crystallinity enhancement and recrystallization of VO₂ thin films during biased reactive sputtering”, 14th International Symposium on Sputtering & Plasma Process(ISSP 2017), TF3-9p, Ishikawa, Japan, August, 2017.

2016年度

• K. Sato, H. Hoshino, Md. Suruz Mian and Kunio Okimura,“Low temperature growth of VO₂ films on ZnO/glass and their transition properties”,The 26th Annual meeting of MRS-J International Symposium: Advanced Functional Oxide Materials, A3-P21-012, Yokohama, Japan, December, 2016.
• Nurul Hanis Azhan, Kunio Okimura, Mustapha Zaghrioui, and Joe Sakai, “Characteristic μm-sized VO₂ domains grown on Al₂O₃ (001) deposited under particular substrate biasing conditions”, The 18th International Conference on Crystal Growth and Epitaxy (ICCGE18), Nagoya, Japan, August 2016.

2015年度

• Nurul Hanis Azhan, Kunio Okimura, Mustapha Zaghrioui, and Joe Sakai, “Crystalline growth and transition characteristics of sputtered VO₂ on Al₂O₃ (001) substrates via rf substrate biasing”, 14th International Union of Materials Research Societies - International Conference on Advanced Materials (IUMRS-ICAM), II-4ThP-65, Jeju, Korea, October 25-29, 2015.

　　 ※本発表はIUMRS-ICAM 2015のBest Poster Award [First place]を受賞した。

• Kui Su, Nurul Hanis Azhan and Kunio Okimura, “Selective growth of VO₂(B) and VO₂(M) films in reactive magnetron sputtering with substrate biasing, 14th International Union of Materials Research Societies - International Conference on Advanced Materials (IUMRS-ICAM), II-4ThP-73, Jeju, Korea, October 25-29, 2015.
• Md. Suruz Mian, Kunio Okimura and Joe Sakai, “Voltage induced electrical oscillation in VO₂-based layered structure device”, 14th International Union of Materials Research Societies - International Conference on Advanced Materials (IUMRS-ICAM), II-4ThP-76, Jeju, Korea, October 25-29, 2015.

　　 ※本発表はIUMRS-ICAM 2015のBest Poster Awardを受賞した。

• Kunio Okimura, Nurul Hanis Azhan, Kui Su, and Joe Sakai, “Effects of radio frequency substrate biasing on insulator-metal transition properties of VO₂ films grown on Al₂O₃ (001) in reactive sputtering”, 14th International Union of Materials Research Societies - International Conference on Advanced Materials (IUMRS-ICAM), Invited talk, (II-4Tu3A2-3(IS), Jeju, Korea, October 25-29, 2015.
• Md. Suruz Mian and Kunio Okimura, “High frequency self-oscillations in VO₂ based out-of-plane device structure”, 13th International Symposium on Sputtering & Plasma Process, MN3-8p, Kyoto, Japan, July 8-10, 2015. Proceedings of ISSP 2015, pp.436-439. 　

　　 ※本発表はISSP 2015のBest Poster Awardを受賞した。

• Nurul Hanis Azhan, Kui Su, Kunio Okimura, Mustapha Zaghrioui, and Joe Sakai, “Appearance of large crystalline domains in VO₂ on Al₂O₃ (001) substrates by rf biased sputtering and its effect on the phase transition properties”, 13th International Symposium on Sputtering & Plasma Process, SP3-5p, Kyoto, Japan, July 8-10, 2015. Proceedings of ISSP 2015, pp.345-348.
• Kui Su, Nurul Hanis Azhan, Kunio Okimura, “Oriented growth of VO₂(B) thin films on Mo foil by reactive sputtering for lithium ion batteries”, 13th International Symposium on Sputtering & Plasma Process, SP1-13p, Kyoto, Japan, July 8-10, 2015. Proceedings of ISSP 2015, pp.55-58.
• Md. Suruz Mian and Kunio Okimura, “Dependence of out-of-plane insulator-metal transition characteristics of VO₂ films on bottom electrode in layered structure device”, 7th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/ 8th International Conference on Plasma-Nano Technology & Science (ISPlasma 2015/IC-PLANTS 2015), (D3-P-14) Nagoya University, Nagoya, Japan, March 26-31, 2015.

　　 ※本発表はISPlasma 2015/IC-PLANTS 2015のBest Poster Presentation Awardを受賞した。

2014年度

• Md. Suruz Mian and Kunio Okimura: Characterization of Insulator-Metal Transition of Vanadium Dioxide Films Grown on Titanium and Titanium Nitride layers, 6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/ 7th International Conference on Plasma-Nano Technology & Science (ISPlasma 2014/IC-PLANTS 2014), Meijo University, Nagoya, Japan, 06aP36 (March 2-6, 2014)
• Nurul Hanis Azhan and Kunio Okimura : The Orientation Growth and the Electrical Properties of VO₂ Thin Films on Si (100) Substrate via Post-Annealing, International Union of Materials Research Societies ? International Conference on Electronic Materials, 2014, TWTC Nangang Exibition Hall, Taipei, Taiwan, F1-P-0358 (2014, June 10-14).
• Md. Suruz Mian and Kunio Okimura : Growth of VO₂ Films on TiN conductive layer with out-of-plane insulator-metal transition by ICP-assisted sputtering method, International Union of Materials Research Societies ? International Conference on Electronic Materials, 2014, TWTC Nangang Exibition Hall, Taipei, Taiwan, F1-P-0359 (2014, June 10-14).

　　 ※本発表はIUMRS-ICM 2014のBest Poster Awardを受賞した。

• Nurul Hanis Azhan, Kui Su, and Kunio Okimura : Controlling the Insulator-Metal Transition Temperature of Stoichiometric VO₂ Films on Sapphire by RF Biased Reactive Sputtering, 1st European Materials Research Society / Materials Research Society of Japan (E-MRS/MRS-J) Joint Symposium, 2014, Yokohama Port Opening Plaza, Yokohama, Japan, XA-P11-007 (2014, December 10-12).